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| Vacuum Evaporation | |||||||||||||||||||||||||
Vacuum Vapor Deposition are used for production of variety types of coating, semiconductor wafer, glasses, lens, toys, lamps, CRT, quartz oscillators, etc.
evaporation boat and electron beam evaporation crucible liner machined from solid-rod, ion beam filaments, electron beam filaments
made of W, Mo, Ta.
Boat: thickness from 0.1 to 0.5mm Crucible liner: capacity from 2cc to 120cc |
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| Arc Chamber of Ion Implanter | |||||||||||||||||||||||||
Ion implantation is a key technology in the semiconductor wafer doping. Our products include arc chamber components,gas pipes, connection components(screw,nut,etc.)radiation shields made of W, Mo, Ta. |
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| Sputtering Target | |||||||||||||||||||||||||
Sputtering is also a key technology in the fabrication of coating. We can supply kinds of sputtering target made of Mo, W, Ta, Nb with purity of 99.95%. |
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